尚光网 本站首页 本所首页 联系我们
10.1117/12.896769ISTPEI8Advances in Optical Thin Films IV7083148168Proc.SPIE2011Experimental/ alumina; attenuated total reflection; ellipsometry; hafnium compounds; optical constants; plasmonics; silicon compounds; silver; sputtered coatings; yttrium compounds/ interface plasmonic properties; ultrathin metal oxide coated silver; conductor-dielectric interface properties; metal-dielectric interface structure; optical properties; r.f. sputter deposition; attenuated total reflectance analysis; ATR; variable-angle spectroscopic ellipsometry; WVASE; Otto configuration; angle-resolved spectra; optical constants; Ag-Al 2O 3; Ag-SiO 2; Ag-Y 2O 3; Ag-HfO 2/ A7320M Collective excitations (surface states); A8115C Deposition by sputtering; A8160B Surface treatment and degradation of metals and alloys; A7820D Optical constants and parameters (condensed matter)/ Ag-Al2O3/int Al2O3/int Al2/int O3/int Ag/int Al/int O/int Al2O3/bin Al2/bin O3/bin Al/bin O/bin Ag/el; Ag-SiO2/int SiO2/int O2/int Ag/int Si/int O/int SiO2/bin O2/bin Si/bin O/bin Ag/el; Ag-Y2O3/int Y2O3/int O3/int Y2/int Ag/int O/int Y/int Y2O3/bin O3/bin Y2/bin O/bin Y/bin Ag/el; Ag-HfO2/int HfO2/int O2/int Ag/int Hf/int O/int HfO2/bin O2/bin Hf/bin O/bin Ag/elSESE8181998168S81681VMany fields of high technology take advantage of conductor-dielectric interface properties. Deeper knowledge of physical processes that determine the optical response of the structures containing metal-dielectric interfaces is important for improving the performance of thin film devices containing such materials. Here we present a study on optical properties of several ultrathin metal oxides deposited over thin silver layers. Some widely used materials (Al2O3, SiO2, Y2O3, HfO2) were selected for deposition by r.f. sputtering, and the created metal-dielectric structures with two of them, alumina and silica, were investigated in this work using attenuated total reflectance (ATR) technique and by variable-angle spectroscopic ellipsometry (VASE). VASE was performed with a help of a commercial ellipsometer at various incident angles and in a wide spectral range. A home-made sample holder manufactured for WVASE ellipsometer and operational in Otto configuration has been implemented for angle-resolved and spectral ATR measurements. Simultaneous analysis of data obtained by these two independent techniques allows elaboration of a representative model for plasmonic-related phenomena at metal-dielectric interface. The optical constants of the interface layers formed between metal and ultrathin oxide layers are investigated. A series of oxides chosen for this study allows a comparative analysis aimed for selection of the most appropriate materials for different applications.http://spiedigitallibrary.org/proceedings/resource/2/psisdg/8168/1?isAuthorized=noAdvances in Optical Thin Films IVInterface plasmonic properties of silver coated by ultrathin metal oxides会议论文EnglishSytchkova, A.; Zola, D.; Grilli, M.L.; Piegari, A.; Fang, M.; He, H.; Shao, J.1403481681V (6 pp.) WOS:000297790800052
外文题目: Interface plasmonic properties of silver coated by ultrathin metal oxides
作者: Sytchkova, A.; Zola, D.; Grilli, M.L.; Piegari, A.; Fang, M.; He, H.; Shao, J.
刊名: Proc.SPIE
来源图书: Advances in Optical Thin Films IV
年: 2011 卷: 8168 文章编号:81681V (6 pp.)
会议名称: Advances in Optical Thin Films IV
英文关键词:

Experimental/ alumina; attenuated total reflection; ellipsometry; hafnium compounds; optical constants; plasmonics; silicon compounds; silver; sputtered coatings; yttrium compounds/ interface plasmonic properties; ultrathin metal oxide coated silver; conductor-dielectric interface properties; metal-dielectric interface structure; optical properties; r.f. sputter deposition; attenuated total reflectance analysis; ATR; variable-angle spectroscopic ellipsometry; WVASE; Otto configuration; angle-resolved spectra; optical constants; Ag-Al 2O 3; Ag-SiO 2; Ag-Y 2O 3; Ag-HfO 2/ A7320M Collective excitations (surface states); A8115C Deposition by sputtering; A8160B Surface treatment and degradation of metals and alloys; A7820D Optical constants and parameters (condensed matter)/ Ag-Al2O3/int Al2O3/int Al2/int O3/int Ag/int Al/int O/int Al2O3/bin Al2/bin O3/bin Al/bin O/bin Ag/el; Ag-SiO2/int SiO2/int O2/int Ag/int Si/int O/int SiO2/bin O2/bin Si/bin O/bin Ag/el; Ag-Y2O3/int Y2O3/int O3/int Y2/int Ag/int O/int Y/int Y2O3/bin O3/bin Y2/bin O/bin Y/bin Ag/el; Ag-HfO2/int HfO2/int O2/int Ag/int Hf/int O/int HfO2/bin O2/bin Hf/bin O/bin Ag/el
英文摘要:
文献类型: 会议论文
正文语种: English
收录类别: ISTP  EI  
DOI: 10.1117/12.896769
全文链接: 点击进入
clickdetails
页面点击量: 13634
文章下载量: 2
visitlog
友情链接:
  上海大恒公司
  南京先进激光技术院
  光学产品库
版权所有 © 2009 中国科学院上海光学精密机械研究所 沪ICP备05015387号
主办:中国科学院上海光学精密机械研究所 上海市嘉定区清河路390号(201800)