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10.1017/hpl.2015.11SCI21-MayBerggren RR, 1997, P SOC PHOTO-OPT INS, V3134, P252, DOI 10.1117/12.295131; Geyl R, 1999, P SOC PHOTO-OPT INS, V3739, P63, DOI 10.1117/12.360188; Jeng YR, 2003, J ELECTROCHEM SOC, V150, pG630, DOI 10.1149/1.1602086; Neaupor J, 2005, Proceedings of the SPIE - The International Society for Optical Engineering, V5965, p59650N, DOI 10.1117/12.633499; Preston F., 1927, J SOC GLASS TECHNOL, V9, P214; Scoff R., 1994, J ELECTROCHEM SOC, V141, P1698; Suratwala T, 2012, INT J APPL GLASS SCI, V3, P14, DOI 10.1111/j.2041-1294.2012.00080.x; Suratwala TI, 2010, J AM CERAM SOC, V93, P1326, DOI 10.1111/j.1551-2916.2010.03607.x; Terrell EJ, 2006, J ELECTROCHEM SOC, V153, pK15, DOI 10.1149/1.2188329; Tesar A. A., 1991, P SOC PHOTO-OPT INS, V1531, P801069399933High Power Laser Sci. Eng.2015continuous polishing; equilibrium state; high accuracy; high efficiency; surface figure controlSILICATo establish the mechanism of surface change in a continuous polishing system, an ideal mathematical model is built based on Winkler's hypothesis and the Preston equation. The basic features of the model are the change rates in the surface peak-valley (PV) values of the workpiece, conditioning disk and pitch lap, rather than the specific surface shapes. In addition, an equilibrium state exists in the system, indicating that the surface change rates are all zero. Under equilibrium, the surface of the lap could remain flat, and it is insensitive to the surface error of the workpiece. These characteristics lay the theoretical foundations for high-efficiency and high-precision polishing. The methods to obtain an equilibrium state with flat surfaces are then proposed and confirmed experimentally. High-precision surfaces better than lambda/10 (lambda = 632.8 nm) are consistently produced experimentally.http://www.opticsjournal.net/Journals/hpl.htmMechanistic study of continuous polishing期刊论文EnglishJiao, Xiang; Zhu, Jianqiang; Fan, Quantang; Li, Yangshuaie16 WOS:000360275000001
外文题目: Mechanistic study of continuous polishing
作者: Jiao, Xiang; Zhu, Jianqiang; Fan, Quantang; Li, Yangshuai
刊名: High Power Laser Sci. Eng.
年: 2015 卷: 3 文章编号:e16
英文关键词:
continuous polishing; equilibrium state; high accuracy; high efficiency; surface figure control
SILICA
英文摘要:
文献类型: 期刊论文
正文语种: English
收录类别: SCI  21-May
DOI: 10.1017/hpl.2015.11
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