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CSCD[鲍建飞 Bao Jianfei], 2012, [中国激光, Chinese Journal of Lasers], V39, P0908004; Barnes S I, 2008, SPIE, 7014, P70140; Britten J, 2004, SPIE. 5273, P1; Britten J A, 2005, Conference Lasers and Electro-Optics, JFB:JFB5; Britten J A, 2015, Diffraction Gratings for High-Intensity Laser Applications; Chen C G, 2002, SPIE, P126; Chen C G, 2003, Beam alignment and image metrology for scanning beam interference lithography:fabricating gratings with nanometer phase accuracy; Clery D, 2010, SCIENCE, V328, P808, DOI 10.1126/science.328.5980.808; Craig Richard Forest, 2003, X-ray Telescope Foil Optics: Assembly, Metrology, and Constraint; Dong Liu, 2007, SPIE, 6834, p68340U; Gao W, 2007, CIRP ANN-MANUF TECHN, V56, P529, DOI 10.1016/j.cirp.2007.05.126; Habara H, 2010, OPT LETT, V35, P1783, DOI 10.1364/OL.35.001783; Heilmann Ralf K, 2001, J Vac Sci Technol B, V19, P2342; [姜珊 Jiang Shan], 2014, [光学学报, Acta Optica Sinica], V34, P0405003; [姜珊 Jiang Shan], 2014, [光学学报, Acta Optica Sinica], V34, P0905003; Joo C, 2002, J VAC SCI TECHNOL B, V20, P3075, DOI 10.1116/1.1523018; Joo Chulmin, 2003, Image Grating Metrology Using a Fresnel Zone Plate; Konkola P T, 2003, Design and Analysis of a Scanning Beam Interference Lithography System for Patterning Gratings with Nanometer-level Distortions; Konkola PT, 2000, J VAC SCI TECHNOL B, V18, P3282, DOI 10.1116/1.1314385; MacQuigg David R, 1977, Appl Opt, V16, P291; Meade D, 2010, NUCL FUSION, V50, DOI 10.1088/0029-5515/50/1/014004; Montoya J, 2006, Toward nano-accuracy in scanning beam interference lithography; Montoya Juan C, 2005, J Vac Sci Technol B, V23, P2640; Montoya Juan C, 2006, Toward Nano-accuracy in Scanning Beam Interference Lithography; Neumann Don B, 1967, Appl Opt, V6, P1097; Odhner Holographics, 2015, Stabilockll Active Fringe Stabilizer; Partlo William N, 1993, J Vac Sci Technol B, V11, P2686; Pati GS, 2002, J VAC SCI TECHNOL B, V20, P2617, DOI 10.1116/1.1520563; Plymouth Grating Laboratory, 2015, Technology: Scanning-Beam Interference Lithography; Qiao J, 2008, OPT LETT, V33, P1684, DOI 10.1364/OL.33.001684; Qiao J, 2007, OPT EXPRESS, V15, P9562, DOI 10.1364/OE.15.009562; RIMMER MP, 1974, APPL OPTICS, V13, P623, DOI 10.1364/AO.13.000623; Schattenburg M, 2005, Method and System for Interference Lithography Utilizing Phase-Locked Scanning Beams. VS 6882744B1; Schattenburg M L, 2002, SPIE. 4608, P116; Schattenburg ML, 1999, J VAC SCI TECHNOL B, V17, P2692, DOI 10.1116/1.591047; [宋莹 Song Ying], 2014, [光学精密工程, Optics and Precision Engineering], V22, P318, DOI 10.3788/OPE.20142202.0318; Underwood J H, 1997, SPIE, 3113, P214; [王艳海 Wang Yanhai], 2014, [激光与光电子学进展, Laser & Optoelectronics Progress], V51, P71404; Zuegel JD, 2006, FUSION SCI TECHNOL, V49, P453, DOI 10.13182/FST06-A1161; 高亮, 2004, 光学与光电技术, V2, P23; 李凤有, 2002, 激光直写光刻技术研究; 邵晶, 2013, 点衍射干涉仪基准波前质量测评研究; 冯胜, 2009, 波前检测技术的研究; 宋莹, 2014, 全息光栅曝光系统干涉条纹静态及动态相位锁定技术研究4467578605210激光与光电子学进展100001扫描干涉场曝光(SBIL)在制作大尺寸、纳米精度的衍射光栅中有着独特的优势。为了充分了解SBIL系统的技术特点,介绍了国内外SBIL技术的发展现状,并针对SBIL系统中的各个关键技术进行技术性的调研与总结,着重分析了各关键技术已有解决方法的基本原理、优点以及存在的局限性,结合具体的光栅应用要求,给出了各关键技术的相应具体指标,展望了其发展趋势。2015gratings; scanning beam interference lithography; diffraction gratings; large-area; nanometer levelScanning beam interference lithography (SBIL) is advantageous to produce large-area linear diffraction gratings that are phase-accuracy to nanometer level. In order to comprehend the merits of SBIL, the research progress on SBIL both in China and abroad are introduced, and the key technologies in SBIL are summarized from the merits and limitation of the scheme and principle. And then for the application of the specific grating, parameters of the key technologies in SBIL are presented. The development of SBIL is forecasted.Status and Development of Scanning Beam Interference Lithography System期刊论文扫描干涉场曝光中关键技术的现状与发展趋势Chinese光栅; 扫描干涉场曝光; 衍射光栅; 大尺寸; 纳米精度程伟林; 朱菁; 张运波; 曾爱军; 黄惠杰 CSCD:5548628
中文题目: 扫描干涉场曝光中关键技术的现状与发展趋势
外文题目: Status and Development of Scanning Beam Interference Lithography System
作者: 程伟林; 朱菁; 张运波; 曾爱军; 黄惠杰
刊名: 激光与光电子学进展
年: 2015 卷: 52 期: 10 页: 100001
中文关键词:
光栅; 扫描干涉场曝光; 衍射光栅; 大尺寸; 纳米精度
英文关键词:
gratings; scanning beam interference lithography; diffraction gratings; large-area; nanometer level
中文摘要:
英文摘要:
文献类型: 期刊论文
正文语种: Chinese
收录类别: CSCD  
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