|
期刊论文
Microelectron. Eng.
2002
61-62
139
144
Segers, M; Bougeard, M; Caprin, E; Ceccotti, T; Normand, D; Schmidt, M; Sublemontier, O
 |
Development of a laser-produced plasma source at 13.5 nm for the French extreme ultraviolet lithography test bench
|
|
作者:
Segers, M; Bougeard, M; Caprin, E; Ceccotti, T; Normand, D; Schmidt, M; Sublemontier, O |
|
来源出版物:
Microelectron. Eng. |
|
出版年:2002
卷:
61-62
页:
139--144 |
|
文献类型:
期刊论文 |
|
|
|
期刊论文
Microelectron. Eng.
2001
57-58
87
92
Lebert, R; Aschke, L; Bergmann, K; Dusterer, S; Gabel, K; Hoffmann, D; Loosen, P; Neff, W; Nickles, P; Rosier, O; Poprawe, R; Rudolph, D; Sandner, W; Sauerbrey, R; Schmahl, G; Schwoerer, H; Stiehl, H; Will, I; Ziener, C
 |
Preliminary results from key experiments on sources for EUV lithography
|
|
作者:
Lebert, R; Aschke, L; Bergmann, K; Dusterer, S; Gabel, K; Hoffmann, D; Loosen, P; Neff, W; Nickles, P; Rosier, O; Poprawe, R; Rudolph, D; Sandner, W; Sauerbrey, R; Schmahl, G; Schwoerer, H; Stiehl, H; Will, I; Ziener, C |
|
来源出版物:
Microelectron. Eng. |
|
出版年:2001
卷:
57-58
页:
87--92 |
|
文献类型:
期刊论文 |
|
|
|
期刊论文
Microelectron. Eng.
2000
53
1-4
681
684
Banine, VY; Benschop, JPH; Werij, HGC
 |
Comparison of extreme ultraviolet sources for lithography applications
|
|
作者:
Banine, VY; Benschop, JPH; Werij, HGC |
|
来源出版物:
Microelectron. Eng. |
|
出版年:2000
卷:
53
期:
1-4
页:
681--684 |
|
文献类型:
期刊论文 |
|
|
|
期刊论文
Microelectron. Eng.
1996
30
1-4
287
290
Ogawa, T; Oizumi, H; Ito, M; Saitou, N
 |
Sensitivity-enhanced dry development process for VUV and EUV lithography using graft-polymerization
|
|
作者:
Ogawa, T; Oizumi, H; Ito, M; Saitou, N |
|
来源出版物:
Microelectron. Eng. |
|
出版年:1996
卷:
30
期:
1-4
页:
287--290 |
|
文献类型:
期刊论文 |
|
|
|
期刊论文
Microelectron. Eng.
2002
61-62
203
211
Hue, J; Quesnel, E; Muffato, V; Pelle, C; Granier, D; Favier, S; Besson, P
 |
Reduction of defect density on blanks: application to the extreme ultraviolet lithography
|
|
作者:
Hue, J; Quesnel, E; Muffato, V; Pelle, C; Granier, D; Favier, S; Besson, P |
|
来源出版物:
Microelectron. Eng. |
|
出版年:2002
卷:
61-62
页:
203--211 |
|
文献类型:
期刊论文 |
|
|
|
期刊论文
Microelectron. Eng.
1999
46
1-4
19
22
Stulen, RH
 |
Progress in the development of extreme ultraviolet lithography exposure systems
|
|
作者:
Stulen, RH |
|
来源出版物:
Microelectron. Eng. |
|
出版年:1999
卷:
46
期:
1-4
页:
19--22 |
|
文献类型:
期刊论文 |
|
|
|